Šta se događa sa TSMC N7+ EUV?
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When compared to N7 (1st Generation 7 nm) that solely relies on deep ultraviolet lithography, TSMC lists its N7+ process as providing a 15% to 20% higher transistor density as well as 10% lower power consumption at the same complexity and frequency. Furthermore, after less than two quarters in production, TSMC is stating that N7+ now matches N7’s yields, which has been used for over a year now.
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